10.1: Emission Spectroscopy Based on Plasma Sources
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- 74332
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- Inductively Coupled Plasma (ICP)
- The inductively coupled plasma (ICP) was developed by Velmer Fassel & Stan Greenfield in the 1960s. It is much hotter than a flame (10,000 K), which causes a high level of ionization for elements with low ionization energy. There is more complete atomization/excitation.
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- Microwave Induced Plasma (MIP)
- A microwave induced plasma is another atomic emission source. Typically, a 2.45 GHz microwave generator (magnetron) produces a wave that travels through a cable and is focused via a tuning system where a torch sits in the center of a cavity. This torch has a carrier gas flowing through the outer portion of the torch (sometimes tangentially, other times not) and the plasma is started (or ignited) via a Tesla coil or a piece of copper wire.
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- Direct Current Plasma (DCP)
- The Direct Current Plasma was developed by William Schrenk over the late 1960s and early 1970s. This emission source utilizes a DC current (40-60 V, 10-15 A, ~750W) which flows between C anodes and W cathode.